Products

Molecular Beam Epitaxy System —MBE-400

Molecular beam epitaxy system is the core equipment for preparing high-performance monocrystal thin films in laboratory, which can be used to prepare high-performance oxide materials, topological insulators and so on. The system adopts a modular design to facilitate subsequent upgrades and maintenance, and can be interconnected with other equipments in our company to achieve the deposition of multiple materials.

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Pulsed Laser Deposition System—PLD-300

PLD-300 equipment comes standard with 6 1-inch target materials, which can achieve deposition of oxides and multi-component thin films. The target material of the equipment can be replaced in situ, and high-quality thin film deposition can be achieved with RHEED and excimer lasers.

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Thermal resistance evaporation equipment TE-100

The TE-100 equipment can achieve evaporation and deposition of metals, dielectric materials, and organic materials. The sample stage can be water-cooled or heated, rotating or adjustable tilt angle. The material is placed in an evaporation boat and heated to the evaporation point, and then the evaporated atoms deposit on the surface of the wafer to form a thin film. Suitable for materials research and production fields.

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Desktop etching equipment Etch-200

The Etch-200 equipment is equipped with an ion source, and the diameter of the ion source can be selected according to the needs, which can achieve cleaning and etching of samples of 4 inches and below.

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