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Production Grade Multifunctional Thin Film Deposition Equipment

This equipment is based on the wafer vacuum transfer platform VTM and can be flexibly equipped with transfer chambers and process chambers. The process chambers can be optionally equipped with electron beam evaporation chambers, molecular beam epitaxy chambers, sputtering chambers, thermal evaporation chambers, and pre cleaning chambers. It can achieve precise deposition of various materials.

R&D Magnetron Sputtering System—MS-700

The MS-700 magnetron sputtering system is a multifunctional and multi cathode magnetron sputtering system, characterized by ultra-high vacuum and single atomic layer deposition accuracy. Circular cathodes up to 4 inches can be configured according to requirements, with options for vertical sputtering, automatic transmission, reactive sputtering, and film thickness measurement. Suitable for medium to high precision process requirements that require multi target sputtering in research and production.

R&D Magnetron Sputtering System—MS-400

This type of magnetron sputtering system is a multi-function and multi-target magnetron sputtering system, which has the characteristics of ultra-high vacuum, single atomic layer deposition accuracy and simple equipment maintenance. The MS-400 system is equipped with six 2-inch confocal ultra-high vacuum cathodes to meet the needs of process research in the laboratory or enterprise laboratory, with simple maintenance and stable operation.

R&D Magnetron Sputtering System - MS-300

The MS-300 magnetron sputtering system has the characteristics of ultra-high vacuum, single atomic layer deposition accuracy, flexible selection of cathode up or down sputtering. The equipment is equipped with three 2-inch ultra-high vacuum cathodes as standard. Meet the needs of laboratory scientific research, with simple maintenance and stable operation.

Thin film process development services

Truth Equipment has various models of high-precision magnetron sputtering equipment, and can customize thin film process development services according to customer needs, providing comprehensive process development and technical support for customers.

Process Menu Customization

The company is committed to building domestic high-end magnetron sputtering equipment, improving the level of independent control of high-end thin film deposition equipment, and endeavors to solve the problem of shortage of equipment and technology in the field of research and manufacture of integrated circuits.

Evaporation source

Magnetron sputtering cathode

PLD manipulator

Tilting high-temperature manipulator

Radiation type high-temperature manipulator-standard version

Production Magnetron Sputtering System—MSI-100-HV

Production magnetron sputtering system is a high performance, low cost and high efficiency magnetron sputtering equipment developed for enterprises, university laboratories and small test lines. The MSI-100 magnetron sputtering equipment adopts a simple and reliable module design, including the load lock chamber and deposition chamber. It can meet the production requirements of nanoscale materials on 8-inch wafers, and has the characteristics of stability, reliability, and low cost.

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