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Production Grade Multifunctional Thin Film Deposition Equipment

This equipment is based on the wafer vacuum transfer platform VTM and can be flexibly equipped with transfer chambers and process chambers. The process chambers can be optionally equipped with electron beam evaporation chambers, molecular beam epitaxy chambers, sputtering chambers, thermal evaporation chambers, and pre cleaning chambers. It can achieve precise deposition of various materials.

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Production Grade Multifunctional Thin Film Deposition Equipment

Production Magnetron Sputtering System—MSI-100-HV

Production magnetron sputtering system is a high performance, low cost and high efficiency magnetron sputtering equipment developed for enterprises, university laboratories and small test lines. The MSI-100 magnetron sputtering equipment adopts a simple and reliable module design, including the load lock chamber and deposition chamber. It can meet the production requirements of nanoscale materials on 8-inch wafers, and has the characteristics of stability, reliability, and low cost.

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Production Magnetron Sputtering System—MSI-100-HV

Production Magnetron Sputtering System—MSI-100-UHV

Production magnetron sputtering system is a high performance and high efficiency magnetron sputtering equipment developed for enterprises, university laboratories and small test lines. This ultra-high vacuum version provides higher deposition chamber vacuum, meeting the needs of high-performance film preparation and small-scale mass production. The extreme vacuum of MSI-100-UHV magnetron sputtering equipment is better than 1×10-8mbar, including load lock chamber and deposition chamber, which can meet the production and preparation needs of high-accuracy nanoscale materials on 8-inch wafers.

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Production Magnetron Sputtering System—MSI-100-UHV

Production Magnetron Sputtering System —MSI-200

The production magnetron sputtering system is a high performance and high efficiency magnetron sputtering equipment developed for production enterprise laboratories and production lines. The MSI-200 magnetron sputtering equipment adopts a design of interconnecting multiple vacuum chambers. The transfer of wafers is achieved through a wafer vacuum transfer module. It can be paired with multiple deposition chambers or processing chambers, suitable for production or experimental lines.

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Production Magnetron Sputtering System —MSI-200
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