Current language:
R&D Magnetron Sputtering System—MS-400
This type of magnetron sputtering system is a multi-function and multi-target magnetron sputtering system, which has the characteristics of ultra-high vacuum, single atomic layer deposition accuracy and simple equipment maintenance. The MS-400 system is equipped with six 2-inch confocal ultra-high vacuum cathodes to meet the needs of process research in the laboratory or enterprise laboratory, with simple maintenance and stable operation.
Key word:
High-accuracy Magnetron Sputtering System, Film Deposition, Process Debugging, Software Development
Category:
R&D Film Deposition Equipment
产品附件：
TEL
R&D Magnetron Sputtering System—MS-400
Details
This type of magnetron sputtering system is a multi-function and multi-target magnetron sputtering system, which has the characteristics of ultra-high vacuum, single atomic layer deposition accuracy and simple equipment maintenance. The MS-400 system is equipped with six 2-inch confocal ultra-high vacuum cathodes to meet the needs of process research in the laboratory or enterprise laboratory, with simple maintenance and stable operation.
Performance Parameters
| Wafer size | 4inch down compatible |
| Uniformity |
Better than±2% |
| Extreme vacuum |
Better than 1×10-9mbar (metal seal ) |
| Heating Temperature | RT-800℃，maximum 1200℃ |
| Number of cathodes | Six to seven 2-inch cathodes, Co-sputtering |
| Power supply | DC、RF、DC Pulse |
| Accuracy |
0.1nm |
| Space | 3m L*2m W*2m H |
| Options | Cryogenic pump, vertical sputtering, automatic transfer, reactive sputtering, QCM, RGA, process menu etc. |
Customer case1
Single free layer and double free layer MTJ magnetic tunnel junction films with strong PMA were prepared by MS-400 research grade magnetron sputtering.
According to the experimental results shown in Figure 1, the Gilbert damping constant of the Mo-based double free layer film is 0.02.
In a prepared p-MTJ structure, HR-TEM, EDS and EELS test results show that the membrane interface is clear, the diffusion rate is low, and the thermal stability is high.
Customer case2
AuSn alloy film
X-ray diffraction test results of AuSn alloy thin film (substrate Si sheet)
Customer case3
TiPtAu multilayer film
SEM scan of TiPtAu multilayer film cross-section
Customer case4
Preparation of RuO2 and other single crystal materials.
The MS-400 magnetron sputtering system can achieve a heating temperature of up to 1200 degrees Celsius, which can meet the needs of single crystal material deposition.
Related products
Production Grade Multifunctional Thin Film Deposition Equipment
This equipment is based on the wafer vacuum transfer platform VTM and can be flexibly equipped with transfer chambers and process chambers. The process chambers can be optionally equipped with electron beam evaporation chambers, molecular beam epitaxy chambers, sputtering chambers, thermal evaporation chambers, and pre cleaning chambers. It can achieve precise deposition of various materials.
R&D Magnetron Sputtering System—MS-700
The MS-700 magnetron sputtering system is a multifunctional and multi cathode magnetron sputtering system, characterized by ultra-high vacuum and single atomic layer deposition accuracy. Circular cathodes up to 4 inches can be configured according to requirements, with options for vertical sputtering, automatic transmission, reactive sputtering, and film thickness measurement. Suitable for medium to high precision process requirements that require multi target sputtering in research and production.
R&D Magnetron Sputtering System—MS-400
This type of magnetron sputtering system is a multi-function and multi-target magnetron sputtering system, which has the characteristics of ultra-high vacuum, single atomic layer deposition accuracy and simple equipment maintenance. The MS-400 system is equipped with six 2-inch confocal ultra-high vacuum cathodes to meet the needs of process research in the laboratory or enterprise laboratory, with simple maintenance and stable operation.
R&D Magnetron Sputtering System - MS-300
The MS-300 magnetron sputtering system has the characteristics of ultra-high vacuum, single atomic layer deposition accuracy, flexible selection of cathode up or down sputtering. The equipment is equipped with three 2-inch ultra-high vacuum cathodes as standard. Meet the needs of laboratory scientific research, with simple maintenance and stable operation.
Provide solutions for your industry and prepare for your choices
Truth Equipment Co., LTD
E-mail:info@truthhefei.com
GeneralAffairs：0551-66026857
Human Resources：0551-66020613
Procurement Consulting：0551-66020659
Commerce Consulting：0551-66020758
Business Consulting：Mr. Hu 19315277762
info@truthhefei.com
WhatsApp
+86-13013196967 