+
  • QQ截图20231018152708.jpg

Software System Customization


1. Real time performance: The fully automatic upper computer software can obtain and display real-time status information during the operation of the device. Users can understand the current situation of the device at any time and take corresponding measures in a timely manner. 2. Visualization: The fully automatic upper computer software presents the complex scheduling and process of the robotic arm through a graphical interface, and adds real-time curve graphs, allowing users to intuitively understand the dynamic status of the equipment. The visual interface can be used to monitor the operation status of the equipment, the progress of the process, and so on. 3. Scalability: The fully automatic upper computer software can be customized according to different customer needs, and can expand different lower level electrical controls to meet various process requirements and achieve various coating processes.

Key word:

High-accuracy Magnetron Sputtering System, Film Deposition, Process Debugging, Software Development

Category:

Customization Services

产品附件:

Software System Customization

Details


Previous

Next


Related products


Production Grade Multifunctional Thin Film Deposition Equipment


This equipment is based on the wafer vacuum transfer platform VTM and can be flexibly equipped with transfer chambers and process chambers. The process chambers can be optionally equipped with electron beam evaporation chambers, molecular beam epitaxy chambers, sputtering chambers, thermal evaporation chambers, and pre cleaning chambers. It can achieve precise deposition of various materials.

R&D Magnetron Sputtering System—MS-700


The MS-700 magnetron sputtering system is a multifunctional and multi cathode magnetron sputtering system, characterized by ultra-high vacuum and single atomic layer deposition accuracy. Circular cathodes up to 4 inches can be configured according to requirements, with options for vertical sputtering, automatic transmission, reactive sputtering, and film thickness measurement. Suitable for medium to high precision process requirements that require multi target sputtering in research and production.

R&D Magnetron Sputtering System—MS-400


This type of magnetron sputtering system is a multi-function and multi-target magnetron sputtering system, which has the characteristics of ultra-high vacuum, single atomic layer deposition accuracy and simple equipment maintenance. The MS-400 system is equipped with six 2-inch confocal ultra-high vacuum cathodes to meet the needs of process research in the laboratory or enterprise laboratory, with simple maintenance and stable operation.

R&D Magnetron Sputtering System - MS-300


The MS-300 magnetron sputtering system has the characteristics of ultra-high vacuum, single atomic layer deposition accuracy, flexible selection of cathode up or down sputtering. The equipment is equipped with three 2-inch ultra-high vacuum cathodes as standard. Meet the needs of laboratory scientific research, with simple maintenance and stable operation.

Provide solutions for your industry and prepare for your choices