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Ultra-high Vacuum Pipe Transfer System
Production magnetron sputtering system is a high performance and high efficiency magnetron sputtering equipment developed for production enterprise laboratories and production line. The MSI-200 magnetron sputtering equipment adopts a design of interconnecting multiple vacuum chambers, and achieves wafer transfer through internal robotic arm of the Cluster. It can be paired with multiple sputtering chambers or processing chambers, suitable for production or experimental lines.
Key word:
High-accuracy Magnetron Sputtering System, Film Deposition, Process Debugging, Software Development
Category:
Vacuum Transfer Module
产品附件：
TEL
Ultra-high Vacuum Pipe Transfer System
Details
Production magnetron sputtering system is a high performance and high efficiency magnetron sputtering equipment developed for production enterprise laboratories and production line. The MSI-200 magnetron sputtering equipment adopts a design of interconnecting multiple vacuum chambers, and achieves wafer transfer through internal robotic arm of the Cluster. It can be combined with multiple sputtering chambers or processing chambers, suitable for production or experimental lines.
Performance Parameters
| Wafer size | 8inch down compatible |
| Extreme vacuum | Better than 5×10-10mbar |
| Port | Each pipeline can be connected to a set of systems, with ports CF250 and below. |
| Transfer device | Magnetic transfer, can transfer multiple pieces at the same time |
| Load lock | Optional independent load lock chamber |
| Calibration device | Photoelectric sensor |
| Vacuum system | Mechanical pump and turbo pump, optional ion pump, etc. |
| Control system | PC+PLC Safety interlock, collision protection, vacuum interlock, etc. |
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