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Electron Beam Evaporation System —E-Beam-HV
The electron beam evaporation system can achieve precise multi-layer thin film preparation in high vacuum and ultra-high vacuum environments. Linear electron beam guns can achieve evaporation of various materials. The equipment can be equipped with a Kaufman ion source to achieve pre cleaning of wafers, which can be used in fields such as superconducting quantum, and is suitable for research and small-scale production in universities and enterprises.
Key word:
High-accuracy Magnetron Sputtering System, Film Deposition, Process Debugging, Software Development
Category:
R&D Film Deposition Equipment
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Electron Beam Evaporation System —E-Beam-HV
Details
The electron beam evaporation system can achieve precise multi-layer thin film preparation in high vacuum and ultra-high vacuum environments. Linear electron beam guns can achieve evaporation of various materials. The equipment can be equipped with a Kaufman ion source to achieve pre cleaning of wafers, which can be used in fields such as superconducting quantum, and is suitable for research and small-scale production in universities and enterprises.
Performance Parameters
| Wafer size | 4inch~8inch |
| Extreme vacuum |
Better than 1×10-7mbar |
| Heating Temperature | RT-800℃ |
| Electron beam gun | Multi crucible rotating electron beam gun, optional with crucible quantity and capacity (standard, 10KW, 8 × 20cc) |
| Wafer cleaning | Optional Kauffman ion source for wafer cleaning |
| Clean uniformity | Example: 4-inch wafer，better than ±3% |
| Control system | PC+PLC，Fully automatic operation and safety interlock |
| Manipulator | 180 degree tilt, 360 degree rotation, optional lifting and bias voltage |
| Film thickness measurement | QCM, retractable |
| Space | 2m L*2m W*2m H |
| Options | Cryogenic pump, load lock chamber, wafer automatic transfer, process menu, etc. |
The choice of enterprise/university performance
Test case series
With the development of superconducting quantum computing, university laboratories and enterprises have extremely high preparation requirements for the core device of superconducting quantum circuits - the Josephson junction. This device can be specifically used to prepare various types of Josephson junctions such as Al based and Nb based. The following are the optical images of the prepared Josephson junctions.
Optical image of Josephson junction
Temperature test
The following figure is a temperature test chart for a heating stage. The heating stage can achieve wafer heating up to 800 degrees Celsius, and the temperature rise during electron beam evaporation is relatively low, meeting the deposition requirements of different materials.
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R&D Magnetron Sputtering System—MS-700
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This type of magnetron sputtering system is a multi-function and multi-target magnetron sputtering system, which has the characteristics of ultra-high vacuum, single atomic layer deposition accuracy and simple equipment maintenance. The MS-400 system is equipped with six 2-inch confocal ultra-high vacuum cathodes to meet the needs of process research in the laboratory or enterprise laboratory, with simple maintenance and stable operation.
R&D Magnetron Sputtering System - MS-300
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