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R&D Magnetron Sputtering System—MS-700

R&D Magnetron Sputtering System—MS-700

The MS-700 magnetron sputtering system is a multifunctional and multi cathode magnetron sputtering system, characterized by ultra-high vacuum and single atomic layer deposition accuracy. Circular cathodes up to 4 inches can be configured according to requirements, with options for vertical sputtering, automatic transmission, reactive sputtering, and film thickness measurement. Suitable for medium to high precision process requirements that require multi target sputtering in research and production.

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Customized system and process menu

Ultra high vacuum components

Production level equipment

R&D Magnetron Sputtering System—MS-400

R&D Magnetron Sputtering System—MS-400

This type of magnetron sputtering system is a multi-function and multi-target magnetron sputtering system, which has the characteristics of ultra-high vacuum, single atomic layer deposition accuracy and simple equipment maintenance. The MS-400 system is equipped with six 2-inch confocal ultra-high vacuum cathodes to meet the needs of process research in the laboratory or enterprise laboratory, with simple maintenance and stable operation.

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Customized system and process menu

Ultra high vacuum components

Production level equipment

Evaporation source

Evaporation source

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Customized system and process menu

Ultra high vacuum components

Production level equipment

Magnetron sputtering cathode

Magnetron sputtering cathode

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Customized system and process menu

Ultra high vacuum components

Production level equipment