Products_list-Truth Equipment Co., LTD,Production level equipment

Ultra-high Vacuum Pipe Transfer System

Production magnetron sputtering system is a high performance and high efficiency magnetron sputtering equipment developed for production enterprise laboratories and production line. The MSI-200 magnetron sputtering equipment adopts a design of interconnecting multiple vacuum chambers, and achieves wafer transfer through internal robotic arm of the Cluster. It can be paired with multiple sputtering chambers or processing chambers, suitable for production or experimental lines.

Two coating systems are directly interconnected

Truth Equipment has also introduced multiple interconnected devices to achieve the interconnection of multiple systems, suitable for 2-8 inch wafers. Ultra-high vacuum transfer of wafers can be achieved through the combination of vacuum pump groups. According to the requirements, two sets of systems can be directly connected, with lower costs and reliable operation. Multiple systems can also be connected through a circular interconnected system. By selecting load lock chambers, ultra-high vacuum transition can be achieved, reducing pollution to the coating system.

Two coating systems are directly interconnected

Circular interconnected system (external robotic arm, internal robotic arm)

Truth Equipment has also developed multiple interconnected devices to achieve the interconnection of multiple systems, suitable for 2-8 inch wafers. Ultra-high vacuum transfer of wafers can be achieved through the combination of vacuum pump groups. According to the requirements, two sets of systems can be directly connected, with lower costs and reliable operation. Multiple systems can also be connected through a circular interconnected system. By selecting load lock chambers, ultra-high vacuum transition can be achieved, reducing pollution to the coating system.

Circular interconnected system (external robotic arm, internal robotic arm)

Radiation type high-temperature manipulator-magnetic field manipulator

Electron Beam Evaporation System —E-Beam-UHV

The electron beam evaporation system can achieve precise multi-layer thin film preparation in high vacuum and ultra-high vacuum environments. Linear electron beam guns can achieve evaporation of various materials. The equipment can be equipped with a Kaufman ion source to achieve pre cleaning of wafers, which can be used in fields such as superconducting quantum, and is suitable for research and small-scale production in universities and enterprises.

Electron Beam Evaporation System —E-Beam-UHV

Electron Beam Evaporation System —E-Beam-HV

The electron beam evaporation system can achieve precise multi-layer thin film preparation in high vacuum and ultra-high vacuum environments. Linear electron beam guns can achieve evaporation of various materials. The equipment can be equipped with a Kaufman ion source to achieve pre cleaning of wafers, which can be used in fields such as superconducting quantum, and is suitable for research and small-scale production in universities and enterprises.

Electron Beam Evaporation System —E-Beam-HV

Sample parking manipulator in the load lock chamber

Linear feedthrough