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Hollow magnetically-coupled rotary feedthrough

Easy linear feedthrough

Rotary feedthrough

Differentially pumped rotary feedthrough

Production Magnetron Sputtering System—MSI-100-UHV

Production magnetron sputtering system is a high performance and high efficiency magnetron sputtering equipment developed for enterprises, university laboratories and small test lines. This ultra-high vacuum version provides higher deposition chamber vacuum, meeting the needs of high-performance film preparation and small-scale mass production. The extreme vacuum of MSI-100-UHV magnetron sputtering equipment is better than 1×10-8mbar, including load lock chamber and deposition chamber, which can meet the production and preparation needs of high-accuracy nanoscale materials on 8-inch wafers.

Production Magnetron Sputtering System —MSI-200

The production magnetron sputtering system is a high performance and high efficiency magnetron sputtering equipment developed for production enterprise laboratories and production lines. The MSI-200 magnetron sputtering equipment adopts a design of interconnecting multiple vacuum chambers. The transfer of wafers is achieved through a wafer vacuum transfer module. It can be paired with multiple deposition chambers or processing chambers, suitable for production or experimental lines.

Molecular Beam Epitaxy System —MBE-400

Molecular beam epitaxy system is the core equipment for preparing high-performance monocrystal thin films in laboratory, which can be used to prepare high-performance oxide materials, topological insulators and so on. The system adopts a modular design to facilitate subsequent upgrades and maintenance, and can be interconnected with other equipments in our company to achieve the deposition of multiple materials.

Retractable linear feedthrough

Magnetically-coupled transfer arm

Gear transfer arm

Port aligner

Viewport shutter

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