Search-Truth Equipment Co., LTD,Production level equipment

Desktop Magnetron Sputtering System —MS-200

The MS-200 magnetron sputtering system is a small desktop sputtering system with high vacuum and single atomic layer deposition accuracy. Flexible selection of cathode up or down sputtering. The equipment is equipped with three 2-inch cathode targets. Meet simple material research needs.

Vacuum Annealing Furnace-VF-200

Vacuum annealing furnace is an effective way to improve the quality of the film, and heating in a special gas atmosphere can also improve the composition of the film. The VF-200 is a standard annealing furnace from Truth Equipment Corporation, which can be interconnected with other process chambers to achieve in situ annealing, or can be used alone. Alternatively, a magnet module can be selected to induce the direction of magnetic thin films. The system is equipped with control software, ensuring stable and reliable operation!

Pulsed Laser Deposition System—PLD-400

The pulse laser deposition series equipment is a commonly used oxide and multi-component thin film deposition equipment in universities and research institutes, which has the characteristics of simplicity, reliability, and stable operation. The PLD-400 pulse laser deposition equipment is equipped with 6 1-inch target materials as standard, which can be replaced in situ. Combined with RHEED and excimer lasers, high-quality thin film deposition can be achieved.

Wafer Vacuum Transfer Module-VTM

Wafer vacuum transfer module adopts quadrilateral, hexagonal or octagonal design, which can realize the interconnection of multiple process chambers. The wafer vacuum transfer module adopts a quadrilateral, hexagonal or octagonal design, which can achieve interconnection of multiple process rooms. The system can be equipped with robotic arms and calibration devices, which can achieve automatic transfer of 8 or 12 inch wafers. The system can be combined with control software to achieve safe and reliable control.

Ultra-high Vacuum Pipe Transfer System

Production magnetron sputtering system is a high performance and high efficiency magnetron sputtering equipment developed for production enterprise laboratories and production line. The MSI-200 magnetron sputtering equipment adopts a design of interconnecting multiple vacuum chambers, and achieves wafer transfer through internal robotic arm of the Cluster. It can be paired with multiple sputtering chambers or processing chambers, suitable for production or experimental lines.

Two coating systems are directly interconnected

Truth Equipment has also introduced multiple interconnected devices to achieve the interconnection of multiple systems, suitable for 2-8 inch wafers. Ultra-high vacuum transfer of wafers can be achieved through the combination of vacuum pump groups. According to the requirements, two sets of systems can be directly connected, with lower costs and reliable operation. Multiple systems can also be connected through a circular interconnected system. By selecting load lock chambers, ultra-high vacuum transition can be achieved, reducing pollution to the coating system.

Circular interconnected system (external robotic arm, internal robotic arm)

Truth Equipment has also developed multiple interconnected devices to achieve the interconnection of multiple systems, suitable for 2-8 inch wafers. Ultra-high vacuum transfer of wafers can be achieved through the combination of vacuum pump groups. According to the requirements, two sets of systems can be directly connected, with lower costs and reliable operation. Multiple systems can also be connected through a circular interconnected system. By selecting load lock chambers, ultra-high vacuum transition can be achieved, reducing pollution to the coating system.

Radiation type high-temperature manipulator-magnetic field manipulator

Electron Beam Evaporation System —E-Beam-UHV

The electron beam evaporation system can achieve precise multi-layer thin film preparation in high vacuum and ultra-high vacuum environments. Linear electron beam guns can achieve evaporation of various materials. The equipment can be equipped with a Kaufman ion source to achieve pre cleaning of wafers, which can be used in fields such as superconducting quantum, and is suitable for research and small-scale production in universities and enterprises.

Electron Beam Evaporation System —E-Beam-HV

The electron beam evaporation system can achieve precise multi-layer thin film preparation in high vacuum and ultra-high vacuum environments. Linear electron beam guns can achieve evaporation of various materials. The equipment can be equipped with a Kaufman ion source to achieve pre cleaning of wafers, which can be used in fields such as superconducting quantum, and is suitable for research and small-scale production in universities and enterprises.

Sample parking manipulator in the load lock chamber

Linear feedthrough